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JEE Main 2020 · Physics · Semiconductors and Communication · medium

Pure silicon has an intrinsic carrier concentration ni = 1.5×10^16 m^-3 at room temperature. It is doped with phosphorus at 4.5×10^22 atoms m^-3, and…

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Pure silicon has an intrinsic carrier concentration ni=1.5×1016 m−3n_i = 1.5\times10^{16}\ \mathrm{m^{-3}} at room temperature. It is doped with phosphorus at 4.5×1022 atoms m−34.5\times10^{22}\ \mathrm{atoms\,m^{-3}}, and every donor atom is ionised. The hole concentration in the doped crystal, in units of 109 m−310^{9}\ \mathrm{m^{-3}}, is
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Answer: 5

Each ionised donor contributes one electron, and 4.5×1022≫ni4.5\times10^{22}\gg n_i, so the electron concentration is n≈ND=4.5×1022 m−3n \approx N_D = 4.5\times10^{22}\ \mathrm{m^{-3}}. The mass-action law n p=ni2n\,p = n_i^2 then gives p=(1.5×1016)24.5×1022=2.25×10324.5×1022=5×109 m−3p = \dfrac{(1.5\times10^{16})^2}{4.5\times10^{22}} = \dfrac{2.25\times10^{32}}{4.5\times10^{22}} = 5\times10^{9}\ \mathrm{m^{-3}}. The crystal is n-type, with holes as the minority carriers.
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